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Chemraz 657

Generic Family: Perfluoroelastomer • Supplied by: Greene, Tweed & Co.
Specifically developed to meet the demands of aggressive dry plasma systems, Chemraz ® 657 perfluoroelastomer’s unique formulation provides enhanced plasma resistance and minimal contamination, resulting in less downtime and higher wafer processing yields. Recommended primarily for both static and dynamic oxide etch wafer processing applications, Chemraz ® 657 remains stable at service temperatures up to 536°F (280°C) with excursions to 572°F (300°C).
General Properties

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Material Status
Commercial: Active
Documents
description

Technical Datasheet (English)

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Availability
North America
Uses
Seals
Other Properties
Forms, Density / Specific Gravity, Tensile Stress at 50%, Tensile Stress at 100%, Tensile Strength, Elongation at Break, Compression Set, Durometer Hardness, Additional Properties
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Processing

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Where To Buy

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